Deposition and etch tool build, improved.
Gas delivery designed into the PVD, sputtering, evaporation, CVD, ALD, and PECVD tools that equipment makers build, and into the R&D and characterization benches behind them. From low-SCCM precursors to high-SLPM carriers, one platform keeps tool builds and experiments moving, with no clean-materials requirement to design around.
Built for fast-moving tool builds and process R&D:
- FastTrack lead times: 3 to 5 business days, every instrument made to order
- True multi-gas accuracy across 130+ gases and mixtures, reselectable in the field
- Fast control: under 10 ms signal response, 100 ms settling to setpoint
- The protocols you already run: EtherCAT, EtherNet/IP, PROFINET, Modbus, DeviceNet
- NIST-traceable, multi-point calibration on every unit
Applications in semiconductor
Engineered to your tool, built to order
Most Alicat instruments in a fab are configured to a specific gas, range, fitting, and protocol. When a catalog configuration is not enough, our engineering team designs the assembly around your tool.
- Bespoke manifolds and assemblies: multi-channel gas panels and integrated assemblies built to your drawing
- Engineering partnership: design-in support from prototype through production, with configurations locked to your spec
- Lifetime support: NIST-traceable recalibration, repair, and footprint-matched replacements that ship in days
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Instruments for semiconductor flow and pressure
Configure to your gas, range, fittings, and protocol. Not sure where to start? Ask an engineer below.
Ask an engineer
Your flow rate, pressure, and choice of gas can all affect which Alicat instruments work for your application.
Our Applications Engineers can answer your questions and help you find the best option.
