Full-scale flow that doesn't change with gases or process conditions
Alicat devices are pre-loaded with 98+ gas calibrations. Flow and pressure devices will maintain their stated flow ranges and accuracy specifications for any gas under standard process conditions.
316L stainless steel and FFKM elastomers ensure compatibility with corrosive gases and harsh elements.
You can switch gases in the field, with no downtime or recalibration required.
Designed to meet SEMI standards
The MCE-Series and MCV-Series mass flow controllers are built to replace legacy devices. To further ensure easy integration, instruments are available with a variety of digital and analog communication protocols including EtherCAT.
Color, cut, clarity, and carat: growing high-quality diamonds
Producing high-quality lab-grown diamonds requires precise control of hydrogen and methane flows, and of the chamber vacuum.
Simplifying the system to reduce cost and complexity
Designing a new sputtering system? Replace downstream throttle valves, vacuum gauges, and PIC control modules using a single upstream pressure controller with integrated capacitance diaphragm vacuum sensors.
Flow instruments controlled directly from your vacuum gauge
The PC-EXTSEN pressure controller sends linear analog signals directly from a vacuum gauge to the Alicat pressure controller. This allows for easy system upgrades without the need for a full redesign.
Custom vacuum setups
Not finding the flow and pressure solutions you need for your thin film deposition application?
