Thin Film Deposition

Optimize thin film deposition setups for maximum throughput and film quality

Delivering gases into vacuum coating systems requires fast response and precise control to ensure that coatings are uniform and have the desired properties. This high degree of uniformity allows for successful thin film depositions in applications ranging from chemical vapor deposition for high-quality synthetic diamonds to sputtering for photovoltaic coatings.

Differential pressure-based mass flow controllers can match legacy devices in form and outperform them in function, allowing you to achieve superior performance without redesigning your system. 316L stainless steel and FFKM elastomers ensure that your devices are compatible even with corrosive gases and harsh elements.

  • No warmup time. Deposition cycles can begin immediately after turning on your flow devices, allowing your process to grow at scale.
  • Millisecond response time. Deposition is highly dynamic – flow and pressure controllers which immediately respond to instantaneous process condition changes minimize losses.
  • Multi-gas compatibility. Various deposition processes need different gas compositions. When you can use a single device for all your setups, with no correction factors, you maintain accuracy while keeping your system lean.
Vacuum chamber used for thin film deposition and CVD

Full-scale flow that doesn't change with gases or process conditions

Alicat devices are pre-loaded with NIST tables for 98-130 gases. This means that flow and pressure devices will maintain their stated flow ranges and accuracy specifications for any gas under standard process conditions.

You can switch gases in the field, no downtime or recalibration required.

Request a quote

Designed to meet SEMI standards

Your facilities are designed around your legacy devices. The MCE- and MCV-Series mass flow controllers are drop-in compatible, helium leak checked, and available with EtherCAT and other digital and analog communication protocols to give you maximally robust process controls.

Alicat MCV-Series mass flow controller for vacuum with integrated pneumatic shut-off valve
Synthetic diamond made using CVD process

Color, cut, clarity, and carat: growing high-quality diamonds

Producing lab-grown diamonds is remarkably similar to thin film coatings. Hydrogen and methane flows need to be precisely controlled, as does the chamber vacuum.

The result? Diamonds which are indistinguishable from mined gems to the human eye.

Simplifying the system to reduce cost and complexity

As you design a new sputtering system, the IVC-Series lets you replace downstream throttle valves, vacuum gauges, and PIC control modules with a single upstream pressure controller, with integrated capacitance diaphragm vacuum sensors.

Vacuum sputtering setup using three Alicat MCV-Series mass flow controllers
Alicat PC-EXTSEN pressure controller with external sensor connector

Flow instruments controlled directly from your vacuum gauge

The PC-EXTSEN pressure controller lets you send a linear analog signal directly from your vacuum gauge to the Alicat pressure controller. This means no system design changes are needed – just drop in the upgraded pressure controller.

Custom vacuum setups

Not finding the flow and pressure solutions you need for your thin film deposition applications? We have trillions of device configurations and a full custom engineering team.

Contact us

Custom setup for thin film deposition using an MCE-Series mass flow controller and an IVC-Series mass flow controller