Full-scale flow that doesn't change with gases or process conditions
Alicat devices are pre-loaded with NIST tables for 98-130 gases. This means that flow and pressure devices will maintain their stated flow ranges and accuracy specifications for any gas under standard process conditions.
You can switch gases in the field, no downtime or recalibration required.
Designed to meet SEMI standards
Your facilities are designed around your legacy devices. The MCE- and MCV-Series mass flow controllers are drop-in compatible, helium leak checked, and available with EtherCAT and other digital and analog communication protocols to give you maximally robust process controls.
Color, cut, clarity, and carat: growing high-quality diamonds
Producing lab-grown diamonds is remarkably similar to thin film coatings. Hydrogen and methane flows need to be precisely controlled, as does the chamber vacuum.
The result? Diamonds which are indistinguishable from mined gems to the human eye.
Simplifying the system to reduce cost and complexity
As you design a new sputtering system, the IVC-Series lets you replace downstream throttle valves, vacuum gauges, and PIC control modules with a single upstream pressure controller, with integrated capacitance diaphragm vacuum sensors.
Flow instruments controlled directly from your vacuum gauge
The PC-EXTSEN pressure controller lets you send a linear analog signal directly from your vacuum gauge to the Alicat pressure controller. This means no system design changes are needed – just drop in the upgraded pressure controller.
Custom vacuum setups
Not finding the flow and pressure solutions you need for your thin film deposition applications? We have trillions of device configurations and a full custom engineering team.