Fast Pressure Controllers & Transducers

Fast Pressure Controllers & Transducers
IVC-Series Integrated Vacuum Controllers

model

IVC-Series Integrated Vacuum Controllers

Fast-responding absolute pressure controller for vacuum control applications

IVC-series integrated vacuum controllers are designed to rapidly control the pressure of pumped vacuum processes. They are available with inline or separately ported (isolated) vacuum sensors. They are usable from 0.01 Torr to 1000 Torr with our broadest range sensor.

Control the absolute pressure in your process chamber. The IVC-series controllers balance the amount of gas introduced into the process with the amount of gas pumped out by the vacuum system. IVC-series controllers integrate a variety of capacitance diaphragm gauges (CDG) for pressure measurement.

Sample calculations for upstream control:

Pressure to be maintained: 10 TorrA

Pumping speed of the vacuum pump: 2 liters per second

Flow rate required: Actual Pressure ÷ Standard Pressure × Pumping Speed = 10 TorrA ÷ 14.696 PSIA × 2 l/s = 0.013 × 2 l/s = 1.6 SLPM

When the device is connected upstream with a separate gas supply for pressure control, we do not have to deal with the expanded volumetric flows. A smaller control valve is used, which enhances control performance and also reduces potential leaks in the system.

Alicat’s IVC-series vacuum controllers are able to achieve and hold set points, even in the face of rapidly changing process conditions, such as uneven mass flows or temperatures. Alicat application engineers will assist you in the selection of appropriate valves and sensors to ensure your controller delivers fast and stable operation.

Fast & Accurate. Very fast valves and PID control algorithms execute on a 1 millisecond control loop, with NIST-traceable accuracy.
Connected. Easy integration with your industrial network protocol with:
- Alicat’s exclusive Multi-Drop RS-232 Serial
- RS-485 Serial
- Modbus RTU (over RS-232 or RS-485)
- Modbus TCP/IP
- DeviceNet
- EtherCAT
- EtherNet/IP
- Profibus
Back-pressure control. Optional downstream valve positioning allows your IVC device to control the flow between your process chamber and vacuum pump. This option works especially well when you cannot install the controller upstream and need the same precise absolute pressure control.

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Available Pressure Ranges (see Part Numbers tab for stock ranges)

Absolute pressure ranges (referenced to hard vacuum)
- 10, 100, and 1000 TorrA single-sensor packages
- 1000 & 10 TorrA dual-sensor package

Performance

Operational Range (Turndown Ratio) ≅ 1000:1
Standard Accuracy Calibration, NIST-traceable: +/- 0.5% of the full-scale range (Zero-offset field correctable by vacuum tare)
Typical Control Response Time: ≥50 ms (adjustable)
Sensor Response Time: 2 ms
Typical Indication Response Time: <10 ms
Sensor Warm-Up Time: Full warm-up time- 2 hours
- Usable for most purposes- 15 minutes

Operating Conditions

Gas Compatibility: Compatible with a wide variety of gases, including most aggressive gases.
- For aggressive gases, please see Alicat’s gas list. Verify compatibility with wetted materials. Not for use with liquid water.
Wetted Materials: 302, 303, 304, and 430FR stainless steel, brass, FKM and FFKM, alumina, 316L stainless body optional.
Operating Temperature: +10 to +50°C
Sensor Crush Pressure: 6 kTorrG (116 PSIG)

Model Variations

Back-pressure configuration (with downstream valve)
External pressure sensor configuration (PC-EXTSEN)
Separate pressure sense port (PC3)
Dual valve configuration for closed volumes (for small process volumes only)
Mass flow reporting vacuum control (MC3)

External Pressure Sensor Configuration (PC-EXTSEN)

If you are working at a level of vacuum beyond the capability of our CDG sensors and would like to use your own vacuum sensor, the PC-EXTSEN pressure controller is best for your application. This configuration allows you to connect an external high vacuum sensor to the IVC controller via the dedicated industrial sensor connector (ISC). This configuration is especially useful for vacuum coating applications.

Valve Options

Control Valve

Your standard Alicat IVC-series vacuum controller is configured with our PCA-series valves. These high-performance proportional control valves have exceptional leak integrity as well as superior corrosion resistance. These valves are available in a variety of orifice sizes suitable for flows from micro-liters per minute to tens of liters per minute.

Downstream valve controllers are often supplied with Alicat’s exclusive Rolamite valves. These high-performance valves are capable of flowing up to 5,000 volumetric liters per minute.

Please get in touch with Alicat Scientific for application assistance and for alternate valve options.

Corrosive Gases

Instruments in the IVC-series are also compatible with corrosive gases. Some corrosive gases require 316L stainless steel throughout the flow path, and in this case we can upgrade the flow body to 316L for full-scale flow ranges of 20 slpm or less. Standard valves on any Alicat pressure controller are made of 316L stainless steel and use FFKM as the elastomer.

Downstream Rolamite valves are compatible with most, but not all, corrosive gases.

Contact Alicat with your precise application details.

Build Options

Communications protocols:
- Alicat’s exclusive Multi-Drop RS-232 Serial
- RS-485 Serial
- Modbus RTU (over RS-232 or RS-485)
- Modbus TCP/IP
- DeviceNet
- EtherCAT
- EtherNet/IP
- Profibus
Displays:
- Back-lit Monochrome LCD with integrated keypad
- Color TFT Display with integrated keypad
- Either configuration set up for remote panel-mounting.
Process connections:
- Compression
- SAE
- Swagelok® (including tube, VCO®, and VCR®)
Electrical connections:
- 6-pin locking
- 8-pin mini-DIN
- 8-pin M12
- DB-9
- DB-15

Base Part Numbers

Inline Pressure Sensing

PC-10TORRA-D-PCAxx
PC-100TORRA-D-PCAxx
PC-1000TORRA-D-PCAxx
PC-1000.10TORRA-D-PCAxx

Isolated Pressure Sensing Port

PC3-10TORRA-D-PCAxx
PC3-100TORRA-D-PCAxx
PC3-1000TORRA-D-PCAxx
PC3-1000.10TORRA-D-PCAxx

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Vacuum control in thin film deposition and synthetic diamond manufacturing (PC3)

Maintain an accurate and stable vacuum in your chamber to ensure an efficient and repeatable deposition process.

Wafer polishing applications using Helium under vacuum conditions (PC, PC3)

Modern wafer cooling processes depend on precise temperature control. Helium’s unique properties under vacuum conditions may be used to facilitate this process.

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